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NY CREATES Albany NanoTech Complex, NanoFab Reflection

Albany, NY. R&D.

NY CREATES, headquartered in Albany, NY

High NA EUV Lithography Center and NanoFab Reflection

Under construction as of Jul 21, 2026

State-funded High NA EUV Lithography Center in the new NanoFab Reflection cleanroom building; ASML scanner components arrived July 2026 and R&D is expected to start early 2027.

Investment
$1B
Jobs
700
Announced
Dec 2023
Target
2027
Type
R&D
Process or product
High NA EUV lithography (ASML TWINSCAN EXE:5200B)
Wafer size
300mm
CHIPS Act funding
none on record

Timeline

  1. Equipment install

    NY CREATES received the lower main module and first major components of the ASML High NA EUV system; installation continues through 2026.

    Office of the Governor of New York
  2. Construction milestone

    NanoFab Reflection (310,000 sq ft building with 50,000 sq ft of cleanroom) topped out; construction completion planned for end of 2026.

    Office of the Governor of New York
  3. Update

    The CHIPS for America NSTC EUV Accelerator at Albany NanoTech began operations.

    NY Governor's Office
  4. Announced

    Governor Hochul announced a $10 billion public-private partnership with IBM, Micron, Applied Materials and Tokyo Electron, including a state-funded High NA EUV center at Albany NanoTech.

    Office of the Governor of New York

Sources (9)

6 suppliers and contractors on record for this project

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Figures are what the company or an agency announced. "Not stated" means no source gives a number for this site. A status is only as current as its "as of" date.